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한국통신학회 한국통신학회논문지 한국통신학회논문지 제24권 12호
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    초록·키워드

    In this paper, the n-channel poly-Si thin-film transistors (poly-Si TFT's) formed by solid phase crystallization (SPC) on glass were investigated by measuring the electrical properties of poly-Si films, such as I-V characteristics, mobility, leakage current, threshold voltage, and subthreshold slope. It is done to decide to be applied on TFT-LCD with large-size and high density. In n-channel poly-Si TFT with 2, 10, 25 μm of channel length, the field effect mobilities are 111, 126, and 125 cm²/V-s and leakage currents are 0.6, 0.1, and 0.02 pA/μm, respectively. Low threshold voltage and subthreshold slope, and good ON-OFF ratio are shown, as well. Thus, the poly-Si TFT's used by SPC are expected to be applied on TFT-LCD with large-size and high density, which can integrate display panel and peripheral circuit on a large glass substrate.

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      UCI(KEPA) : I410-ECN-0101-2009-567-012247326