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논문 기본 정보

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학술저널
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한국표면공학회 한국표면공학회지 한국표면공학회지 제29권 제5호
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357 - 362 (6page)

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초록· 키워드

Several applications of radio-frequency (RF) thermal plasma to film formation are reviewed. Three types of injection plasma processing (IPP) technique are first introduced for the deposition of materials. Those are thermal plasma chemical vapor deposition (CVD), plasma flash evaporation, and plasma spraying. Radio-frequency (RF) plasma and hybrid (combination of RF and direct current(DC))plasma are next introduced as promising thermal plasma sources in the IPP technique. Experimental data for three kinds of processing are demonstrated mainly based on our recent researches of depositions of functional materials, such as high temperature semiconductor SiC and diamond, ionic conductor ZrO₂-Y₂O₃, and high critical temperature superconductor YBa₂Cu₃O₇₋ₓ. Special emphasis is given to thermal plasma flash evaporation, in which nanometer-scaled clusters generated in plasma flame play important roles as nanometer-scaled clusters as deposition species. A novel epitaxial growth mechanism from the “hot” clusters namely “hot cluster epitaxy (HCE)” is proposed.
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목차

  1. ABSTRACT
  2. INTRODUCTION
  3. RF INJECTION PLASMA PROCESSING (RF-IPP) FOR DEPOSITION
  4. HOT CLUSTER EPLTAXY(HCE)
  5. SUMMARY
  6. REFERENCES

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