지원사업
학술연구/단체지원/교육 등 연구자 활동을 지속하도록 DBpia가 지원하고 있어요.
커뮤니티
연구자들이 자신의 연구와 전문성을 널리 알리고, 새로운 협력의 기회를 만들 수 있는 네트워킹 공간이에요.
논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 발행연도
- 2005.1
- 수록면
- 415 - 419 (5page)
이용수
초록· 키워드
오류제보하기
A novel electron beam lithography technique was utilized to fabricate nano scale magnetic dots array with high periodicity. C60 film (fullerine) was used as an electron beam sensitive resist for electron beam patterning carried out under a high accelerating voltage of 200 kV in a transmission electron microscope with a scanning mode. 50 nm sized permalloy (Py) nanodot arrays were successfully fabricated using the method followed by ion-milling. An array of Co nanodots having a size of 100 × 70 nm was alternatively prepared by liftoff instead of ion milling so as to prevent surface damage by ion milling. Lift-off does not yield any surface roughness, which is important for device fabrication. Magnetic force microscopy (MFM) observations were carried out on the fabricated Co nanodot arrays. A single domain state could be realized in patterned Co nanodots. MFM tip induced magnetization effects were also clearly demonstrated in the array of Co nanodots.
목차
등록된 정보가 없습니다.
참고문헌 (0)
참고문헌 신청이 논문의 저자 정보
최근 본 자료
댓글(0)
0