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대한전기학회 전기학회논문지 C 전기학회논문지 제55C권 제5호
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    초록·키워드

    The present study is devoted to investigate numerically the optical characteristics of multi-layer thin film structures such as Si/SiO₂ and Ge/Si/SiO₂ by using the characteristic transmission matrix method. The reflectivity and the absorptivity rate for thin film structures are estimated for different incident angles of rays and various film thicknesses. In addition, the influence of wavelength on optical characteristics related to complex refractive index is examined. It is found that such wave-like characteristics are observed in predicting reflectivities and depends mainly on film thickness. Moreover, the present study predicts the film thickness for ignoring wave interference effects, and it also discusses the fundamental physics behind optical and energy absorption characteristics appearing in multi-layer thin film structures.

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      UCI(KEPA) : I410-ECN-0101-2009-560-018829038