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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 발행연도
- 2010.12
- 수록면
- 624 - 632 (9page)
이용수
초록· 키워드
Perfluorocarbons (PFCs) are widely used in semiconductor industry. These gases need to be removed efficiently because of their strong absorption of infrared radiation and long atmospheric lifetimes which cause the global warming effect.
To destruct CF₄, a waterjet gliding arc plasma was designed and manufactured. The highest CF₄ destruction showed at waterjet plasma case, compared to plasma discharge only or water scrubber only, respectively. In addition, it could be known that the CF₄ destruction should be associated with the electron and OH radicals.
The operating conditions such as waterjet flow rate, initial CF₄ concentration, total gas flow rate, specific energy input were investigated experimentally using a plasma waterjet scrubber. Through the parametric studies, the highest CF₄ destruction of 94.5% was achieved at 0.2% CF₄, 2.1 kJ/L SEI, 20 L/min total gas flow rate and 18.5 mL/min waterjet flow rate.
상세정보 수정요청해당 페이지 내 제목·저자·목차·페이지To destruct CF₄, a waterjet gliding arc plasma was designed and manufactured. The highest CF₄ destruction showed at waterjet plasma case, compared to plasma discharge only or water scrubber only, respectively. In addition, it could be known that the CF₄ destruction should be associated with the electron and OH radicals.
The operating conditions such as waterjet flow rate, initial CF₄ concentration, total gas flow rate, specific energy input were investigated experimentally using a plasma waterjet scrubber. Through the parametric studies, the highest CF₄ destruction of 94.5% was achieved at 0.2% CF₄, 2.1 kJ/L SEI, 20 L/min total gas flow rate and 18.5 mL/min waterjet flow rate.
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목차
- Abstract
- 1. 서론
- 2. 플라즈마 반응의 메카니즘
- 3. 실험
- 4. 결과 및 고찰
- 5. 결론
- 감사의 글
- 참고문헌
참고문헌
참고문헌 신청최근 본 자료
UCI(KEPA) : I410-ECN-0101-2012-539-003761747
