Etching characteristics of ZnO thin films using inductively coupled BCl₃ / Ar and Cl₂ / Ar plasma

S-W. Na ,  M-H. Shin ,  Y-M. Chung 외 4명

한국진공학회 학술발표회초록집

2004 .08

Characterization of inductively coupled Ar/CH4 plasma using tuned single langmuir probe and fluid simulation

차주홍 ,  한문기 ,  김동현 외 2명

한국진공학회 학술발표회초록집

2015 .08

Investigation on Etch Characteristics of FePt Magnetic Thin Films Using a CH4/Ar Plasma

Eun Ho Kim ,  Hwa Won Lee ,  Tae Young Lee 외 1명

한국진공학회 학술발표회초록집

2011 .02

Etch Characteristics of MgO Thin Films in Cl2/Ar, CH3OH/Ar, and CH4/Ar Plasmas

Il Hoon Lee ,  Tea Young Lee ,  Chee Won Chung

한국진공학회 학술발표회초록집

2013 .02

Inductively Coupled Plasma Reactive Ion Etching of MgO Thin Films Using a CH₄/Ar Plasma

Hwa Won Lee ,  Eun Ho Kim ,  Tae Young Lee 외 1명

한국진공학회 학술발표회초록집

2011 .02

Dry etching of Al₂O₃ thin films in inductively coupled plasma system

Seok SON ,  Young Hee JOO ,  Chang Il KIM

한국진공학회 학술발표회초록집

2016 .08

Effects of Etch Parameters on Etching of CoFeB Thin Films in CH₄/O₂/Ar Mix

Tea Young Lee ,  Il Hoon Lee ,  Chee Won Chung

한국진공학회 학술발표회초록집

2012 .02

The Influence of O₂ Gas on the Etch Characteristics of FePt Thin Films in CH₄/O₂/Ar gas

Il Hoon Lee ,  Tea Young Lee ,  Chee Won Chung

한국진공학회 학술발표회초록집

2012 .02

Etching characteristics of Ta and TaN using Cl2 / Ar inductively coupled plasma

M. H. Shin ,  S. W. Na ,  N.-E. Lee 외 1명

한국진공학회 학술발표회초록집

2004 .08

Etch Characteristics of FePt Magnetic Thin Films Using Inductively Coupled Plasma Reactive Ion Etching

Eun Ho Kim ,  Yu Bin Xiao ,  Hwa Won Lee 외 1명

한국자기학회 학술연구발표회 논문개요집

2010 .12

Inductively coupled plasma etching of chemical vapor deposition amorphous carbon in O₂/N₂/Ar chemistries

H.J. Lee ,  Y.R. Pa ,  k 외 6명

한국진공학회 학술발표회초록집

2008 .08

고밀도 반응성 이온 식각을 이용한 IrMn 자성 박막의 식각

이태영 ,  소우빈 ,  김은호 외 2명

한국진공학회 학술발표회초록집

2011 .02

Infinitely high etch selectivity of indium tin oxide (ITO) layer to photoresist during CH₄/H₂/Ar inductively coupled plasma (ICP) etching

D. Y. Kim ,  J. H. Ko ,  M. S. Pa 외 2명

한국진공학회 학술발표회초록집

2006 .08

Inductively Coupled Plasma의 Numerical Simulation

주정훈

한국진공학회 학술발표회초록집

1998 .07

Properties of Inductively coupled Ar/CH4 plasma based on plasma diagnostics with fluid simulation

차주홍 ,  손의정 ,  윤용수 외 3명

한국진공학회 학술발표회초록집

2016 .02

Dry etching of SiC in inductively coupled $SF_6/O_2$ Plasma

Yim ,  Jeong-Hyuk ,  Lee 외 13명

한국결정학회 학술연구발표회

2007 .01

High density plasma etching of CoFeB and IrMn magnetic films with Ti hard mask

Y.B. Xiao ,  E.H. Kim ,  S.M. Kong 외 1명

한국진공학회 학술발표회초록집

2010 .02

Analysis of chemical reactions of CF₄ and C₄F₈ for inductively coupled plasma based on plasma parameters

J. J. Lee ,  S. J. Kim ,  Y. S. Lee 외 2명

한국진공학회 학술발표회초록집

2019 .08

Si Fin etching using Cl₂/Ar Sync, Asynchronized Pulsed Inductively Coupled Plasmas

김희주 ,  김교운 ,  홍종우 외 2명

한국진공학회 학술발표회초록집

2020 .08

Plasma parameters variation in O₂ / He, Ar, Xe inductively coupled plasma as a function of mixing ratio

배근희 ,  유신재 ,  엄환섭 외 1명

한국진공학회 학술발표회초록집

2001 .07