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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- Korean Society for Precision Engineering Journal of the Korean Society for Precision Engineering 한국정밀공학회지 Vol.28 No.12
- 발행연도
- 2011.12
- 수록면
- 1,419 - 1,424 (6page)
이용수
초록· 키워드
오류제보하기
Nanoimprint lithography is a next generation lithography technology, which enables to fabricate nano to micron-scale patterns through simple and low cost process. Nanoimprint lithography has been applied in various industry fields such as light emitting diodes, solar cells and display. Functional patterns, including anti-reflection moth-eye pattern, photonic crystal pattern, fabricated by nanoimprint lithography are used to improve overall efficiency of devices in that fields. For these reasons, in this study, sub-micron-scaled functional patterns were directly fabricated on Si and glass substrates by thermal imprinting process using ZnO nano-partlcles dispersion resin. Through the thermal imprinting process, arrays of sub-micron-scaled pillar and hole patterns were successfully fabricated on the Si and glass substrates. And then, the topography, components and optical property of the imprinted ZnO nano-particles/resin patterns are characterized by Scanning Electron Microscope, Energy-dispersive X-ray spectroscopy and UV-vis spectrometer, respectively.
목차
1. 서론
2. 실험 과정
3. 실험 결과
4. 결론
참고문헌
참고문헌 (11)
참고문헌 신청
Chou, S. Y / 1996 / Nanoimprint lithography / Journal of VacuumScience and Technology B 14(6):4129~4133
Chou, S. Y / 1995 / Imprint of sub-25 nm vias and trenches inpolymers / Applied Physics Letters 67(21):3114~3116
Byeon, K. J / 2007 / Fabricationof two-dimensional photonic crystal patterns on GaNbasedlight-emitting diodes using thermally curablemonomer-based nanoimprint lithography / AppliedPhysics Letters 91(9):091106
이헌 / 2009 / Direct indium tin oxide patterning using thermal nanoimprint lithography for highly efficient optoelectronic devices / J. Vac. Sci. Technol. B 27(6):2786~2789
Han, K. S / 2009 / Fabrication of anti-reflection structure on protective layer of solar cells by hot-embossing method / SOLAR ENERGY MATERIALS AND SOLAR CELLS 93(8):1214~1224
Chou, S. Y / 1995 / Imprint of sub-25 nm vias and trenches inpolymers / Applied Physics Letters 67(21):3114~3116
Byeon, K. J / 2007 / Fabricationof two-dimensional photonic crystal patterns on GaNbasedlight-emitting diodes using thermally curablemonomer-based nanoimprint lithography / AppliedPhysics Letters 91(9):091106
이헌 / 2009 / Direct indium tin oxide patterning using thermal nanoimprint lithography for highly efficient optoelectronic devices / J. Vac. Sci. Technol. B 27(6):2786~2789
Han, K. S / 2009 / Fabrication of anti-reflection structure on protective layer of solar cells by hot-embossing method / SOLAR ENERGY MATERIALS AND SOLAR CELLS 93(8):1214~1224
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