지원사업
학술연구/단체지원/교육 등 연구자 활동을 지속하도록 DBpia가 지원하고 있어요.
커뮤니티
연구자들이 자신의 연구와 전문성을 널리 알리고, 새로운 협력의 기회를 만들 수 있는 네트워킹 공간이에요.
초록· 키워드
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Thermal plasma has been presented for the decomposition of perfluorocompounds (PFCs) which are extensively used in the semiconductor manufacturing and display industry. We developed pilot-scale equipment to investigate the large scale treatment of PFCs and called it a “thermal plasma scrubber”. PFCs such as CF₄, C₂F<SUB>6</SUB>, SF<SUB>6</SUB>, and NF₃ used in experiments were diluted with N₂. There were two different types of experiment setup related to the water spray direction inside the thermal plasma scrubber. The first type was that the water was sprayed directly into the gas outlet located at the exit of the reaction section. The second type was that the water was sprayed on the wall of the quenching section. More effective decomposition took place when the water was sprayed on the quenching section wall. For C₂F<SUB>6</SUB>, SF<SUB>6</SUB>, and NF₃ the maximum destruction and removal efficiency was nearly 100%, and for CF₄ was up to 93%.
목차
Abstract
1. Introduction
2. Experimental
3. Results and Discussion
4. Conclusions
Acknowledgments
Reference
참고문헌 (20)
참고문헌 신청
1. [학술지(정기간행물)] - Chang, J. P / 2003 / Plasma-Surface Interactions / J. Vac. Sci. Tech. A 21 (5) : 145 ~ 151
2. [학술지(정기간행물)] - Allgood, C. C / 2003 / Fluorinated Gases for Semiconductor Manufacture:Process Advances in Chemical Vapor DepositionChamber Cleaning / J. Fluorine Chem 122 : 105 ~ 112
3. [학술지(정기간행물)] - Namose, I / 2003 / Optimization of Gas Utiliztion in Plasm Processes / Semicon. Manufacturing 16 : 429 ~ 435
4. [학술지(정기간행물)] - Tsai, W. T / 2002 / A Review ofUses, Environmental Hazards and Recovery/Recycle Technologiesof Perfluorocarbons (PFCs) Emissions from the SemiconductorManufacturing Processes / J. Loss Prevention Proc.Ind 15 : 65 ~ 75
5. [학술지(정기간행물)] - Lee, H. J / 1998 / Waste Minimization TechnologyTrends in Semiconductor Industries / Clean Technology 4 (1) : 6 ~ 23
2. [학술지(정기간행물)] - Allgood, C. C / 2003 / Fluorinated Gases for Semiconductor Manufacture:Process Advances in Chemical Vapor DepositionChamber Cleaning / J. Fluorine Chem 122 : 105 ~ 112
3. [학술지(정기간행물)] - Namose, I / 2003 / Optimization of Gas Utiliztion in Plasm Processes / Semicon. Manufacturing 16 : 429 ~ 435
4. [학술지(정기간행물)] - Tsai, W. T / 2002 / A Review ofUses, Environmental Hazards and Recovery/Recycle Technologiesof Perfluorocarbons (PFCs) Emissions from the SemiconductorManufacturing Processes / J. Loss Prevention Proc.Ind 15 : 65 ~ 75
5. [학술지(정기간행물)] - Lee, H. J / 1998 / Waste Minimization TechnologyTrends in Semiconductor Industries / Clean Technology 4 (1) : 6 ~ 23
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UCI(KEPA) : I410-ECN-0101-2013-505-003381994