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논문 기본 정보
- 자료유형
- 학술대회자료
- 저자정보
- 발행연도
- 2013.12
- 수록면
- 3,918 - 3,922 (5page)
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초록· 키워드
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After Nano Imprint Lithography (NIL) process, the collapse of imprinted nano patterns which are major problem for pattern fidelity is commonly found. We assumed that insufficient relaxation time and the initial stress of polymer resist on which the pattern is imprinted have a relation with that collapse phenomenon. In this study, therefore, we measured the stress of polymer nano films for the different film thickness by varying spin-coating speed. The results show that the stress of PMMA film was found to decrease with increasing film thickness and the patterns was rapidly collapsed when the stress-thickness ratio increased.
목차
Abstract
1. Introduction
2. Experimental Method
3. Results & Discussion
4. Conclusion
References
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