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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 발행연도
- 2009.1
- 수록면
- 1,028 - 1,032 (5page)
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초록· 키워드
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In this study, the influences of silicon-based gas barrier films fabricated by using a facing target sputtering(FTS) system on the gas permeability for flexible displays have been investigated. Under these optimum conditions on the SiOx film with oxygen concentration(O2/Ar+O2) of 3.3% and the SiOxNy film with nitrogen concentration(N2/Ar+O2+N2) of 30% deposited by the FTS system, it was found that the films were grown about 4 times higher deposition rate than that of the conventional sputtering system and showed high transmittance about 85% in the visible light range. Particularly, the polyethylene naphthalate(PEN) substrates with the SiOx and/or SiOxNy films showed the enhanced properties of decreased water vapor transmission rate(WVTR) over 10-1 g/㎡․day compared with the PEN substrate without any gas barrier films, which was due to high packing density in the Si-based films with high plasma density by FTS process and/or the denser chemical structure of Si-N bond in the SiOxNy film.
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참고문헌 (13)
참고문헌 신청
A. G. Erlat / 2001 / Characterization of aluminum oxynitride gas barrier films / Thin Solid Films 388 (1-2) : 78 ~
A. G. Erlat / 2004 / Mechanism of water vapor transport through PET/AlOxNy gas barrier films / J. Phys. Chem. B 108 (3) : 883 ~
A. Gruniger / 2004 / Influence of defects in SiOx thin films on their barrier porperties / Thin Solid Films 459 (1-2) : 308 ~
J. Shim / 2008 / Silicon oxynitride gas barrier coatings on poly(ether sulfone) by plasma- enhanced chemical vapor deposition / Surf. Coat. Tech. 202 (13) : 2844 ~
L. N. He / 2003 / Properties of amorphous SiO2 films prepared by reactive RF magnetron sputtering method / Vacuum 68 (2) : 197 ~
A. G. Erlat / 2004 / Mechanism of water vapor transport through PET/AlOxNy gas barrier films / J. Phys. Chem. B 108 (3) : 883 ~
A. Gruniger / 2004 / Influence of defects in SiOx thin films on their barrier porperties / Thin Solid Films 459 (1-2) : 308 ~
J. Shim / 2008 / Silicon oxynitride gas barrier coatings on poly(ether sulfone) by plasma- enhanced chemical vapor deposition / Surf. Coat. Tech. 202 (13) : 2844 ~
L. N. He / 2003 / Properties of amorphous SiO2 films prepared by reactive RF magnetron sputtering method / Vacuum 68 (2) : 197 ~
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스퍼터링 변수에 따른 SiOxNy 막의 특성 ( The Characteristics of SiOxNy Thin Films Fabricated as a Function of Sputtering Variables )
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Preparation of ITO Thin Films for Display Application with $O_2$ Gas Flow Ratio and Input Current by FTS (Facing Targets Sputtering) System
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Alignment Effect of a Nematic Liquid Crystal on Deposited SiOx Thin-Film Surface with e-beam Evaporation
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Wafer Size Effect in Chemical Mechanical Polishing (CMP) of Silicon Dioxide (SiO2) Film
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EBE growth and properties of CuInS2 thin film
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RF-diode Sputtering법으로 제작한 Co박막의 자기특성과 미세구조
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