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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 한국진공학회(ASCT) Journal of Korean Vacuum Science & Technology Journal of Korean Vacuum Science & Technology Vol.2 No.1
- 발행연도
- 1998.4
- 수록면
- 32 - 36 (5page)
이용수
초록· 키워드
오류제보하기
A MeV ion implantation system with an 1.7 MV tandem Van de Graaff accelerator has been installed in the Korea Institute of Geology, Mining and Materials. Almost all ions from hydrogen to uranium with several MeV can be implanted. The implantation system consists of a raster beam scanner with scanning frequency 64×517 ㎐, a target holder capable of holding 5×5 ㎠ sample, a target cooler, an electron flooding gun and a Faraday cup with electron suppressor. The energy range of ions are from about 200 keV to 3.4 MeV in the case of hydrogen and about 200 keV to 12 MeV for As for instance. The maximum beam current at the target is about 5 μA depending on the ion production capability of the ion sources. The implantation nonuniformity is about 6%. The performance of the charge neutralization system is shown.
목차
Abstract
Ⅰ. Introduction
Ⅱ. KIGAM MeV Implantation System
Ⅲ. Implantation Uniformity
Ⅳ. Charge Neutralization
Ⅴ. Conclusion
Acknowledgements
References
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