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학술연구/단체지원/교육 등 연구자 활동을 지속하도록 DBpia가 지원하고 있어요.
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연구자들이 자신의 연구와 전문성을 널리 알리고, 새로운 협력의 기회를 만들 수 있는 네트워킹 공간이에요.
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As the fabrication technology used in FPDs(flat-panel displays) advances, the size of these panels is increasing and the pattern size is decreasing to the um range. Accordingly, a cleaning process during the FPD fabrication process is becoming more important to prevent yield reductions. The purpose of this study is to develop a FPD cleaning system and a cleaning process using a two-phase flow. The FPD cleaning system consists of two parts, one being a cleaning part which includes a two-phase flow nozzle, and the other being a drying part which includes an air-knife and a halogen lamp. To evaluate the particle removal efficiency by means of two-phase flow cleaning, silica particles $1.5{\mu}m$ in size were contaminated onto a six-inch silicon wafer and a four-inch glass wafer. We conducted cleaning processes under various conditions, i.e., DI water and nitrogen gas at different pressures, using a two-phase-flow nozzle with a gap distance between the nozzle and the substrate. The drying efficiency was also tested using the air-knife with a change in the gap distance between the air-knife and the substrate to remove the DI water which remained on the substrate after the two-phase-flow cleaning process. We obtained high efficiency in terms of particle removal as well as good drying efficiency through the optimized conditions of the two-phase-flow cleaning and air-knife processes.
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참고문헌 (8)
참고문헌 신청
배재흠 / 2010 / 액정 세척용 수계 세정제의 배합성분과 혼합비에 따른 성능 변화 / 청정기술 16(2):103~116
박창범 / 2010 / LCD 제조공정에서 물리적 세정법의 미립자 제거효율 비교 연구 / 한국산학기술학회논문지 11(3):795~801
R. Gouk / 2008 / Proc. of SPIE 7122:712211~712218
Y. Hirota / 2005 / in proceeding of Semiconductor Manufacturing, 2005. ISSM 2005, IEEE International Symposium :219
K. Masui / 2008 / Proc. of SPIE 7028:702809~702801
박창범 / 2010 / LCD 제조공정에서 물리적 세정법의 미립자 제거효율 비교 연구 / 한국산학기술학회논문지 11(3):795~801
R. Gouk / 2008 / Proc. of SPIE 7122:712211~712218
Y. Hirota / 2005 / in proceeding of Semiconductor Manufacturing, 2005. ISSM 2005, IEEE International Symposium :219
K. Masui / 2008 / Proc. of SPIE 7028:702809~702801
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