Dry etching of Al₂O₃ thin films in inductively coupled plasma system

Seok SON ,  Young Hee JOO ,  Chang Il KIM

한국진공학회 학술발표회초록집

2016 .08

Effects of Post - Deposition Heat Treatment on the Properties of Low Dielectric Constant Plasma Polymerized Decahydronaphthalene Thin Films Deposited by Plasma - Enhanced Chemical Vapor Deposition

양재영 ,  심천만 ,  정동근

한국진공학회 학술발표회초록집

2001 .02

Low - k plasma polymerized cyclohexane : single layer and double layer

최자영 ,  권영춘 ,  여상학 외 1명

한국진공학회 학술발표회초록집

2000 .02

Inductively Coupled Plasma의 Numerical Simulation

주정훈

한국진공학회 학술발표회초록집

1998 .07

Inductively coupled plasma etching of chemical vapor deposition amorphous carbon in O₂/N₂/Ar chemistries

H.J. Lee ,  Y.R. Pa ,  k 외 6명

한국진공학회 학술발표회초록집

2008 .08

Analysis of chemical reactions of CF₄ and C₄F₈ for inductively coupled plasma based on plasma parameters

J. J. Lee ,  S. J. Kim ,  Y. S. Lee 외 2명

한국진공학회 학술발표회초록집

2019 .08

Experimental investigation on plasma density distribution at a wafer-level in an inductively coupled plasma using multiple passive resonant antennas

홍영훈 ,  김주호 ,  이무현 외 2명

한국진공학회 학술발표회초록집

2020 .08

Development of an Improved Numerical Methodology for Design and Modification of Large Area Plasma Processing Chamber

김호준 ,  이승무 ,  원제형

한국진공학회 학술발표회초록집

2014 .02

Oxide 및 Nitride 고선택비 식각 공정에서의 CF4(CHF3)/O2/Ar inductively coupled pulsed plasmas

김희주 ,  신예지 ,  김교운 외 4명

한국진공학회 학술발표회초록집

2020 .02

Two - dimensional simulation of inductively coupled large - area plasma source

S. E. Pa ,  k ,  J. K. Lee 외 2명

한국진공학회 학술발표회초록집

2002 .02

Inductively Coupled Plasma 장치에서 Hybrid Plasma Model을 활용한 C₂F₈/ O₂ 가스의 특성 해석

김환호 ,  이정열 ,  박희성 외 2명

한국진공학회 학술발표회초록집

2019 .08

Characterization of Low-Temperature Graphene Growth with Plasma Enhanced Chemical Vapor Deposition

Yifei Ma ,  Daekyoung Kim ,  Guoqing Xin 외 1명

한국진공학회 학술발표회초록집

2012 .02

A Review of Inductively Coupled Plasma-Assisted Magnetron Sputter System

Tae Hyung Kim ,  Geun Young Yeom

Applied Science and Convergence Technology

2019 .09

Experimental investigation on the plasma generation efficiency and plasma parameters in inductively coupled plasmas with a serial and a parallel antenna

김태우 ,  강현주 ,  정진욱

한국진공학회 학술발표회초록집

2017 .08

Research on parallelization mechanism of inductively coupled plasma for large area plasma source

이장재 ,  김시준 ,  김광기 외 5명

한국진공학회 학술발표회초록집

2016 .02

Effect of SiF₄ addition on the structures of silicon films deposited at low temperature by remote plasma enhanced chemical vapor deposition

Xiaodong Li ,  Young-Bae Pa ,  k 외 2명

한국진공학회 학술발표회초록집

1995 .06

Interfaces properties of low dielectric constant SiOC(-H) films deposited by plasma enhanced chemical vapor deposition

Chang Young Kim ,  Heang Seuk Lee ,  Jong Kwan Woo 외 1명

한국진공학회 학술발표회초록집

2009 .08

Investigation of Gas Injection Effect in Inductively Coupled Plasma with Fluorocarbon Plasma

Jinha Hwang ,  Minshik Kim ,  Keunju Pa 외 2명

한국진공학회 학술발표회초록집

2009 .02

Plasma Optical Signal Analysis for SiNx Plasma Enhanced Chemical Vapor Deposition Processes

Yooncheol Shin ,  Sun Jung Kim ,  Sangin Lee 외 1명

한국진공학회 학술발표회초록집

2019 .08

Inductively Coupled Plasma 방전의 Global Modelling 과 Simulation

유광일 ,  윤남석 ,  황순모

한국진공학회 학술발표회초록집

1997 .07