This study addresses the electrical and optical properties of radio frequency magnetron sputtered AZO(aluminum doped zinc oxide) films. A systematic study of the influence of deposition parameters such as RF power, Ar gas flow rate, process pressure on the electrical and optical properties of the as-grown AZO films was carried out. With increasing RF power the growth rate increased, while the resistivity decreased. The Ar gas flow rate and process pressure did not affect the growth rate. The as-grown AZO films not only have an average transmittance of > 90 % in the visible region, but also have resistivity of approximately 1 × 10<SUP>-3</SUP> Ohm·cm, depending on the sputtering parameters.