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논문 기본 정보

자료유형
학술저널
저자정보
Kim, Hyung-Taek (Department of Advanced Materials Engineering, College of Engineering, Incheon National University) Cho, Han-Ho (Department of Advanced Materials Engineering, College of Engineering, Incheon National University)
저널정보
한국인터넷방송통신학회 International journal of internet, broadcasting and communication : IJIBC International journal of internet, broadcasting and communication : IJIBC 제7권 제2호
발행연도
2015.1
수록면
28 - 35 (8page)

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Thin film electronic devices which brought the current mobile environment could be fabricated only under the high quality vacuum conditions provided by high vacuum systems. Especially for the development of advanced thin film devices, constant high quality vacuum as the deposition pressure is definitely needed. For this purpose, the variable conductance throttle valves were employed to the high vacuum system. In this study, the effects of throttle valve applications on vacuum characteristics were simulated to obtain the optimum design modelling of variable conductance of high vacuum system. Commercial simulator of vacuum system, $VacSim^{(multi)}$, was used on this investigation. Reliability of employed simulator was verified by the simulation of the commercially available models of high vacuum system. Simulated vacuum characteristics of the proposed modelling were agreed with the observed experimental behaviour of real systems. Pressure limit valve and normally on-off control valve were schematized as the modelling of throttle valve for the constant process-pressure of below $10^{-3}torr$. Simulation results were plotted as pump down curve of chamber, variable valve conductance and conductance logic of throttle valve. Simulated behaviors showed the applications of throttle valve sustained the process-pressure constantly, stably, and reliably.

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