지원사업
학술연구/단체지원/교육 등 연구자 활동을 지속하도록 DBpia가 지원하고 있어요.
커뮤니티
연구자들이 자신의 연구와 전문성을 널리 알리고, 새로운 협력의 기회를 만들 수 있는 네트워킹 공간이에요.
논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 한국진공학회(ASCT) Applied Science and Convergence Technology Applied Science and Convergence Technology Vol.29 No.6
- 발행연도
- 2020.11
- 수록면
- 162 - 166 (5page)
이용수
초록· 키워드
오류제보하기
Pulsed inductively coupled plasma (ICP) is widely used owing to its advantages of increasing plasma uniformity and reducing charge-induced damage in low-temperature semiconductor processing. In this research, the plasma parameters of pulsed plasma were investigated via fluid-based simulation, assuming a two-dimensional axisymmetric structure of the ICP equipment used in semiconductor processing. To improve the simulation accuracy, the capacitive electric field was considered along with an inductive electric field. In addition, the simulation was conducted under Druyvesteyn electron energy distribution function (EEDF) conditions, as the EEDFs of ICP tend to be non-Maxwellian. Results obtained in this study were compared with the experimental values to prove the simulation validity.
목차
ABSTRACT
1. Introduction
2. Experimental details
3. Results and discussion
4. Conclusions
References
참고문헌 (10)
참고문헌 신청
함께 읽어보면 좋을 논문
논문 유사도에 따라 DBpia 가 추천하는 논문입니다. 함께 보면 좋을 연관 논문을 확인해보세요!
-
Inductively Coupled Plasma Simulation Based on Electron Energy Distribution Function and Process Pressure
Applied Science and Convergence Technology
2020 .11
-
Oxide 및 Nitride 고선택비 식각 공정에서의 CF4(CHF3)/O2/Ar inductively coupled pulsed plasmas
한국진공학회 학술발표회초록집
2020 .02
-
Modified Fluid Simulation of an Inductively Coupled Plasma Discharge
Applied Science and Convergence Technology
2019 .11
-
Si Fin etching using Cl₂/Ar Sync, Asynchronized Pulsed Inductively Coupled Plasmas
한국진공학회 학술발표회초록집
2020 .08
-
Experimental investigation on plasma density distribution at a wafer-level in an inductively coupled plasma using multiple passive resonant antennas
한국진공학회 학술발표회초록집
2020 .08
-
Inductively Coupled Plasma Discharge Simulation for the Semiconductor Process Considering Impedance Calculation in 3D Asymmetric Structure
Applied Science and Convergence Technology
2020 .03
-
Diagnostics and modeling of inductively coupled methane plasma using the electrostatic probe and plasma simulations
한국진공학회 학술발표회초록집
2017 .02
-
Inductively Coupled Plasma 장치에서 Hybrid Plasma Model을 활용한 C₂F8/ O₂ 가스의 특성 해석
한국진공학회 학술발표회초록집
2019 .08
-
Dry etching of Al₂O3 thin films in inductively coupled plasma system
한국진공학회 학술발표회초록집
2016 .08
-
Effects of the Capacitive Field in an Inductively Coupled Plasma Discharge
Applied Science and Convergence Technology
2017 .09
-
Analysis of chemical reactions of CF₄ and C₄F8 for inductively coupled plasma based on plasma parameters
한국진공학회 학술발표회초록집
2019 .08
-
Experimental investigation on the plasma generation efficiency and plasma parameters in inductively coupled plasmas with a serial and a parallel antenna
한국진공학회 학술발표회초록집
2017 .08
-
Development of methodology for Individual control of ion and radical in dual freqeuncy(13.56 ㎒ + 400 ㎑) pulsed Ar/CF₄/O₂ plasma
한국진공학회 학술발표회초록집
2021 .02
-
Study on the electrical and optical diagnosis of electron temperatures according to conditions of plasma emission light intensity in inductively coupled plasma
한국진공학회 학술발표회초록집
2016 .08
-
Characterization of inductively coupled Ar/CH4 plasma using tuned single langmuir probe and fluid simulation
한국진공학회 학술발표회초록집
2015 .08
-
Effects of pulse modulation in Ar/H₂ inductively coupled plasma using fluid simulation
한국진공학회 학술발표회초록집
2017 .08
-
낮은 GWP를 가진 CxF2xO 을 이용한 SiO2 식각 공정 특성에 관한 연구
한국진공학회 학술발표회초록집
2020 .02
-
Properties of Inductively coupled Ar/CH4 plasma based on plasma diagnostics with fluid simulation
한국진공학회 학술발표회초록집
2016 .02
-
Investigation of effect of rf bias frequency on plasma parameters in a remote inductively coupled plasma
한국진공학회 학술발표회초록집
2018 .08
-
Research on parallelization mechanism of inductively coupled plasma for large area plasma source
한국진공학회 학술발표회초록집
2016 .02
이 논문의 저자 정보
최근 본 자료
댓글(0)
0
UCI(KEPA) : I410-ECN-0101-2021-420-000049481