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논문 기본 정보
- 자료유형
- 학술대회자료
- 저자정보
- 발행연도
- 2021.2
- 수록면
- 279 - 279 (1page)
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A unique RF superimposed DC sputtering technique was used to tailor the plasma during the sputtering process and to control the kinetics for the growth of a-IZO. The growth dynamics were controlled to achieve high optoelectronic properties, low surface roughness and low residual stress for flexible devices ... 전체 초록 보기
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