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논문 기본 정보

자료유형
학술저널
저자정보
Chengru Wang (Shanghai Jiao Tong University) Han Wu (ShanghaiTech University) Hong Zhu (Shanghai Jiao Tong University) Chaoying Xie (Shanghai Jiao Tong University)
저널정보
대한금속·재료학회 Electronic Materials Letters Electronic Materials Letters Vol.16 No.5
발행연도
2020.1
수록면
506 - 511 (6page)

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초록· 키워드

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Indium phosphide (InP) is one of the most important optoelectronic materials, while stacking faults (SFs), as planar defects,are usually inevitable during the growth of InP possibly due to the low SF energy. As n-type dopants, sulfur atoms are generallyused to change the electron concentration of InP-based devices, whereas the effects of sulfur doping on SFs of InP havenot been studied in detail. In this work, the generalized stacking fault (GSF) energies of pure and sulfur-doped InP have beeninvestigated by gliding the layers successively in the framework of first principle calculations. The results reveal the stableSF energies of InP are low and extrinsic stacking fault could be seen as the twin embryos in pure InP. Sulfur doping coulddecrease the GSF energies dramatically due to the lower charge density along In-S bonds than along In-P bonds, which consequentlyenhances the ability of twinning locally. The preferential segregation of sulfur atoms on SFs or twin boundariescould further promote the thickening of microtwin in InP. These results are of great significance to the understanding of theformation of planar defects in n-type doped III–V compounds.

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