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초록· 키워드
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The development of various nanoscience and nanotechnology over the past decades has progressed complementarily with the development of microscopic technology. In particular, SPEM (Scanning Photoelectron Microscopy) is developing into a powerful tool for material analysis and characterization using well-established synchrotron radiation technology. Beam focusing optical technology for SPEM has reached 50 nm beyond 100 nm in continuous efforts to realize the maximum spatial resolution that is difficult for conventional XPS to achieve. As a result, the utilization of this experimental technique is increasing as the field of research on flake-type low-dimensional materials has expanded rapidly. Furthermore, the value of use in research on next-generation all solid states secondary batteries is also increasing as it has recently evolved into a research technique incorporation measurement technique in an operando environment such as driving a voltage-applied device. In this report, we introduce the fundamental measurement principle of SPEM and several research results using SPEM.
목차
1. 연 X-선 분광현미경(SPEM)의 이해
2. 연 X-선 분광현미경(SPEM)의 연구 동향 및 그 활용
3. 맺음말
References
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